GENEVA, Sept. 7 -- WONIK IPS CO., LTD. filed a patent application (KR2025/018943) for “METHOD FOR NITRIDING METAL OXIDE FILM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME”. With publication no. WO/2026/182335, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H10P 10/00
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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