International Patent: METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR SUBSTRATE, AND ELEMENT SUBSTRATE

GENEVA, Oct. 30 -- KYOCERA CORPORATION filed a patent application (JP2026/016251) for “METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR SUBSTRATE, AND ELEMENT SUBSTRATE”. With publication no. WO/2026/225581, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H10H 20/825

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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