International Patent: METHOD FOR MANUFACTURING PATTERN LAYER THROUGH UV IMPRINTING METHOD AND CARD INCLUDING SAME

GENEVA, Oct. 15 -- NANO-X CO.,LTD. filed a patent application (KR2026/004132) for “METHOD FOR MANUFACTURING PATTERN LAYER THROUGH UV IMPRINTING METHOD AND CARD INCLUDING SAME”. With publication no. WO/2026/216781, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: B42D 25/425

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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