GENEVA, July 1 -- POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION filed a patent application (KR2025/020122) for “METHOD FOR CONSTRUCTING RETINAL MODEL”. With publication no. WO/2026/127475, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C12N 5/071
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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