GENEVA, Oct. 1 -- CARL ZEISS SMT GMBH filed a patent application (EP2026/056687) for “METHOD FOR COMPENSATING FOR AN IMAGE DISPLACEMENT AND MASK INSPECTION DEVICE, METHOD FOR PRODUCING A SEMICONDUCTOR CHIP AND SEMICONDUCTOR CHIP”. With publication no. WO/2026/190140, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G03F 7/20
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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