International Patent: METHOD AND SYSTEM FOR DETERMINING EXPOSURE PARAMETER OF IMAGING DEVICE

GENEVA, Aug. 31 -- ZHEJIANG DAHUA TECHNOLOGY CO., LTD. filed a patent application (CN2025/116497) for “METHOD AND SYSTEM FOR DETERMINING EXPOSURE PARAMETER OF IMAGING DEVICE”. With publication no. WO/2026/174749, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H04N 23/70

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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