International Patent: METHOD, COMPUTER PROGRAM PRODUCT AND CONTROL DEVICE FOR DETERMINING A REPAIR SHAPE FOR A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK AND METHOD OF PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK

GENEVA, Aug. 14 -- CARL ZEISS SMT GMBH filed a patent application (EP2026/053031) for “METHOD, COMPUTER PROGRAM PRODUCT AND CONTROL DEVICE FOR DETERMINING A REPAIR SHAPE FOR A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK AND METHOD OF PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK”. With publication no. WO/2026/167090, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 1/72

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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