INTERNATIONAL PATENT: MERCK PATENT GMBH FILES APPLICATION FOR "RESIST PATTERN FORMING COMPOSITION AND USE THEREOF"

GENEVA, March 19 -- MERCK PATENT GMBH (Frankfurter Strasse 25064293 Darmstadt) filed a patent application (PCT/EP2025/075037) for "RESIST PATTERN FORMING COMPOSITION AND USE THEREOF" on Sep 03, 2025. With publication no. WO/2026/052658, the details related to the patent application was published on Mar 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KUBO, Yuki (c/o Merck Electronics Ltd.3330 ChihamaKakegawa-shi, Shizuoka 437-1412), NAGAHARA, Tatsuro (c/o Merck Electronics Ltd.3330 ChihamaKakegawa-shi, Shizuoka 437-1412)

Abstract: To provide a resist pattern forming composition and a met...