INTERNATIONAL PATENT: MEIDENSHA CORPORATION, 株式会社明電舎 FILES APPLICATION FOR "ELECTRON SOURCE, ELECTRON BEAM EMISSION STRUCTURE, FIELD EMISSION DEVICE AND METHOD FOR MANUFACTURING ELECTRON SOURCE"

GENEVA, March 30 -- MEIDENSHA CORPORATION (1-1, Osaki 2-chome, Shinagawa-ku, Tokyo1416029), 株式会社明電舎 (東京都品川区大崎２丁目１番１号) filed a patent application (PCT/JP2025/031571) for "ELECTRON SOURCE, ELECTRON BEAM EMISSION STRUCTURE, FIELD EMISSION DEVICE, AND METHOD FOR MANUFACTURING ELECTRON SOURCE" on Sep 08, 2025. With publication no. WO/2026/063251, the details related to the patent application was published on Mar 26, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WI...