GENEVA, Sept. 7 -- SHIN-ETSU CHEMICAL CO., LTD. filed a patent application (JP2025/007175) for “MASK AND LASER PROCESSING METHOD”. With publication no. WO/2026/181279, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: B23K 26/066
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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