International Patent: LOW REFRACTIVE INDEX FILM COMPRISING HOLLOW SILICA AND METHOD FOR PRODUCING SAME

GENEVA, Aug. 7 -- NISSAN CHEMICAL CORPORATION filed a patent application (JP2026/001458) for “LOW REFRACTIVE INDEX FILM COMPRISING HOLLOW SILICA AND METHOD FOR PRODUCING SAME”. With publication no. WO/2026/163877, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G02B 1/113

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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