International Patent: LINERS FOR DEFECT REDUCTION AND SOURCE/DRAIN FORMATION, AND RELATED METHODS, APPARATUS, AND PROCESSING CHAMBERS

GENEVA, Aug. 14 -- APPLIED MATERIALS, INC. filed a patent application (US2026/013825) for “LINERS FOR DEFECT REDUCTION AND SOURCE/DRAIN FORMATION, AND RELATED METHODS, APPARATUS, AND PROCESSING CHAMBERS”. With publication no. WO/2026/169686, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H10D 84/01

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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