INTERNATIONAL PATENT: LAM RESEARCH CORPORATION FILES APPLICATION FOR "TOPOGRAPHICALLY SELECTIVE ETCH WITH HALOGENATED CARBON"

GENEVA, March 19 -- LAM RESEARCH CORPORATION (4650 Cushing ParkwayFremont, California 94538) filed a patent application (PCT/US2025/045419) for "TOPOGRAPHICALLY SELECTIVE ETCH WITH HALOGENATED CARBON" on Sep 08, 2025. With publication no. WO/2026/055635, the details related to the patent application was published on Mar 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BAKER, Jonathan Grant (4650 Cushing ParkwayFremont, California 94538), AGARWAL, Pulkit (4650 Cushing ParkwayFremont, California 94538)

Abstract: Examples are disclosed that relate to shaping a feature using a topologically ...