INTERNATIONAL PATENT: LAM RESEARCH CORPORATION FILES APPLICATION FOR "SELECTIVE ETCH WITH RESPECT TO CARBON MASK TO PROVIDE LOCAL CD UNIFORMITY"

GENEVA, Feb. 18 -- LAM RESEARCH CORPORATION (4650 Cushing ParkwayFremont, California 94538) filed a patent application (PCT/US2025/039556) for "SELECTIVE ETCH WITH RESPECT TO CARBON MASK TO PROVIDE LOCAL CD UNIFORMITY" on Jul 29, 2025. With publication no. WO/2026/035464, the details related to the patent application was published on Feb 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VEBER, Gregory Clinton (c/o Lam Research Corporation4650 Cushing Parkway, M/S CA-1Fremont, California 94538), JIANG, Nanke (c/o Lam Research Corporation4650 Cushing Parkway, M/S CA-1Fremont, California 9453...