INTERNATIONAL PATENT: LAM RESEARCH CORPORATION FILES APPLICATION FOR "PLASMA PROCESSING SYSTEM WITH UPPER ELECTRODE, SUBSTRATE SUPPORT AND EDGE RING SYSTEM WITH REDUCED ETCH NON-UNIFORMITY AND ARCING"

GENEVA, April 8 -- LAM RESEARCH CORPORATION (4650 Cushing ParkwayFremont, California 94538) filed a patent application (PCT/US2025/047526) for "PLASMA PROCESSING SYSTEM WITH UPPER ELECTRODE, SUBSTRATE SUPPORT, AND EDGE RING SYSTEM WITH REDUCED ETCH NON-UNIFORMITY AND ARCING" on Sep 23, 2025. With publication no. WO/2026/072558, the details related to the patent application was published on Apr 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): RAMESH, Hemanth (4650 Cushing ParkwayFremont, California 94538), KANG, Philjun (4650 Cushing ParkwayFremont, California 94538), OBULAPURAM, Sai Pavan...