INTERNATIONAL PATENT: LAM RESEARCH CORPORATION FILES APPLICATION FOR "PLASMA CHAMBER WITH HIGH FREQUENCY RF SIGNAL AND SLAVE LOW FREQUENCY RF SIGNAL TO UPPER ELECTRODE FOR PLASMA PROCESS CONTROL"

GENEVA, Feb. 24 -- LAM RESEARCH CORPORATION (4650 Cushing ParkwayFremont, California 94538) filed a patent application (PCT/US2025/040987) for "PLASMA CHAMBER WITH HIGH FREQUENCY RF SIGNAL AND SLAVE LOW FREQUENCY RF SIGNAL TO UPPER ELECTRODE FOR PLASMA PROCESS CONTROL" on Aug 06, 2025. With publication no. WO/2026/039262, the details related to the patent application was published on Feb 19, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MARAKHTANOV, Alexei (4650 Cushing ParkwayFremont, Califirnia 94538), JI, Bing (4650 Cushing ParkwayFremont, California 94538), LUCCHESI, Kenneth (4650 Cush...