INTERNATIONAL PATENT: KOLON INDUSTRIES, INC., 코오롱인더스트리 주식회사 FILES APPLICATION FOR "PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM PHOTORESIST USING SAME, MANUFACTURING METHOD THEREOF, RESIST PATTERN AND DEVICE"

GENEVA, April 7 -- KOLON INDUSTRIES, INC. (110, Magokdong-roGangseo-guSeoul 07793), 코오롱인더스트리 주식회사 (서울특별시강서구마곡동로 110) filed a patent application (PCT/KR2025/014863) for "PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM PHOTORESIST USING SAME, MANUFACTURING METHOD THEREOF, RESIST PATTERN, AND DEVICE" on Sep 23, 2025. With publication no. WO/2026/071664, the details related to the patent application was published on Apr 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Propert...