INTERNATIONAL PATENT: KOKUSAI ELECTRIC CORPORATION, 株式会社ＫＯＫＵＳＡＩ ＥＬＥＣＴＲＩＣ FILES APPLICATION FOR "SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND PROGRAM"

GENEVA, March 10 -- KOKUSAI ELECTRIC CORPORATION (1-9-5 Otemachi, Chiyoda-ku, Tokyo1000004), 株式会社ＫＯＫＵＳＡＩ　ＥＬＥＣＴＲＩＣ (東京都千代田区大手町一丁目９番５号) filed a patent application (PCT/JP2025/013205) for "SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND PROGRAM" on Mar 31, 2025. With publication no. WO/2026/048113, the details related to the patent application was published on Mar 05, 2026.

Notably, the patent application was submitted under ...