INTERNATIONAL PATENT: KOKUSAI ELECTRIC CORPORATION, 株式会社ＫＯＫＵＳＡＩ ＥＬＥＣＴＲＩＣ FILES APPLICATION FOR "SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, PROGRAM AND SUBSTRATE PROCESSING APPARATUS"

GENEVA, April 28 -- KOKUSAI ELECTRIC CORPORATION (1-9-5 Otemachi, Chiyoda-ku, Tokyo1000004), 株式会社ＫＯＫＵＳＡＩ　ＥＬＥＣＴＲＩＣ (東京都千代田区大手町一丁目９番５号) filed a patent application (PCT/JP2024/037182) for "SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, PROGRAM, AND SUBSTRATE PROCESSING APPARATUS" on Oct 18, 2024. With publication no. WO/2026/083574, the details related to the patent application was published on Apr 23, 2026.

Notably, the patent application was submitted under ...