INTERNATIONAL PATENT: KOKUSAI ELECTRIC CORPORATION, 株式会社ＫＯＫＵＳＡＩ ＥＬＥＣＴＲＩＣ FILES APPLICATION FOR "SUBSTRATE PROCESSING DEVICE, PLASMA GENERATION METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND PROGRAM"

GENEVA, Feb. 17 -- KOKUSAI ELECTRIC CORPORATION (3-4, Kandakaji-cho, Chiyoda-ku, Tokyo1010045), 株式会社ＫＯＫＵＳＡＩ　ＥＬＥＣＴＲＩＣ (東京都千代田区神田鍛冶町３丁目４番地) filed a patent application (PCT/JP2024/027945) for "SUBSTRATE PROCESSING DEVICE, PLASMA GENERATION METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND PROGRAM" on Aug 05, 2024. With publication no. WO/2026/033603, the details related to the patent application was published on Feb 12, 2026.

Notably, the patent application was submitted und...