GENEVA, March 18 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2025/042677) for "SYSTEMS AND METHODS FOR DUAL-CONJUGATE IMAGING FOR OVERLAY METROLOGY" on Aug 19, 2025. With publication no. WO/2026/054975, the details related to the patent application was published on Mar 12, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): HILL, Andrew V. (57399 Lake Aspen Ln.Sunriver, Oregon 97707), DOLEV, Ido (Manof 2720184 Manof), NEGRI, Daria (Ha'Alon Street 38/136811 Nesher), LAHAV, Oren (Tamar 86083308 Adi)
Abstract: A metrology system for imaging...