GENEVA, March 3 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2025/041432) for "
APODIZATION MEASUREMENT OPTICS AND MEASUREMENT METHOD FOR EUV RETICLE INSPECTION TOOL
" on Aug 11, 2025. With publication no. WO/2026/043670, the details related to the patent application was published on Feb 26, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): HIDAKA, Yasuhiro (760 Live Oak WaySan Jose, California 95129), LEE, Junwon (991 East Taylor St.San Jose, California 95112)
Abstract: An inspection system may be an EUV reticle inspection tool. The ...