INTERNATIONAL PATENT: KEMIRA OYJ FILES APPLICATION FOR "USE OF AN ANIONIC COMPOSITION AND A METHOD FOR SURFACE SIZING"

GENEVA, March 30 -- KEMIRA OYJ (Energiakatu 400180 Helsinki) filed a patent application (PCT/FI2025/050485) for "USE OF AN ANIONIC COMPOSITION AND A METHOD FOR SURFACE SIZING" on Sep 19, 2025. With publication no. WO/2026/062329, the details related to the patent application was published on Mar 26, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HIETANIEMI, Matti (c/o Kemira OyjP.O. Box 44FI-02271 Espoo), KORHONEN, Markus (c/o Kemira OyjP.O. Box 44FI-02271 Espoo), KARPPI, Asko (c/o Kemira OyjP.O. Box 44FI-02271 Espoo), GRONDAHL, Julius (c/o Kemira OyjP.O. Box 44FI-02271 Espoo), NURMI, Leena...