INTERNATIONAL PATENT: JSR CORPORATION, ＪＳＲ株式会社 FILES APPLICATION FOR "RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PRODUCING COMPOUND AND POLYMER"

GENEVA, April 19 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), ＪＳＲ株式会社 (東京都港区東新橋一丁目９番２号) filed a patent application (PCT/JP2025/033332) for "RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PRODUCING COMPOUND, AND POLYMER" on Sep 22, 2025. With publication no. WO/2026/079112, the details related to the patent application was published on Apr 16, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO). ...