INTERNATIONAL PATENT: JACK, DERRICK FILES APPLICATION FOR "DUAL PRESSURE ZONE POSITIVE AIRWAY PRESSURE MASK"

GENEVA, April 29 -- JACK, Derrick (2645 N Fontana CirMesa, AZ 85213) filed a patent application (PCT/US2025/050940) for "DUAL PRESSURE ZONE POSITIVE AIRWAY PRESSURE MASK" on Oct 14, 2025. With publication no. WO/2026/085140, the details related to the patent application was published on Apr 23, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): JACK, Derrick (2645 N Fontana CirMesa, AZ 85213)

Abstract: A dual pressure zone PAP mask is provided. The dual pressure zone PAP mask includes a nasal mask coupled to a PAP air supply with a PAP airline, an oral mask, and a pressure relief vent valve. T...