International Patent: ION SOURCE AND METHOD FOR CONTROLLING ION SOURCE

GENEVA, Oct. 1 -- HITACHI, LTD. filed a patent application (JP2025/029187) for “ION SOURCE AND METHOD FOR CONTROLLING ION SOURCE”. With publication no. WO/2026/191182, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H01J 27/16

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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