International Patent: INTERLAYER WITH METAL SALT, METHOD OF MAKING THE INTERLAYER, AND ANODELESS ALL-SOLID-STATE BATTERY INCLUDING THE INTERLAYER

GENEVA, July 27 -- SAMSUNG SDI CO., LTD. filed a patent application (KR2026/000917) for “INTERLAYER WITH METAL SALT, METHOD OF MAKING THE INTERLAYER, AND ANODELESS ALL-SOLID-STATE BATTERY INCLUDING THE INTERLAYER”. With publication no. WO/2026/155566, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H01M 10/0585

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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