International Patent: INDUCTIVELY COUPLED PLASMA REACTOR FOR TREATING EXHAUST GAS FROM SEMICONDUCTOR MANUFACTURING EQUIPMENT

GENEVA, July 6 -- LOT CES CO., LTD. filed a patent application (KR2025/010430) for “INDUCTIVELY COUPLED PLASMA REACTOR FOR TREATING EXHAUST GAS FROM SEMICONDUCTOR MANUFACTURING EQUIPMENT”. With publication no. WO/2026/141818, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H01J 37/32

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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