International Patent: III-NITRIDE ALLOY GROWTH VIA ATOMIC LAYER DEPOSITION

GENEVA, Aug. 7 -- THE REGENTS OF THE UNIVERSITY OF MICHIGAN filed a patent application (US2026/013498) for “III-NITRIDE ALLOY GROWTH VIA ATOMIC LAYER DEPOSITION”. With publication no. WO/2026/165480, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H10N 30/07

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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