GENEVA, July 1 -- APPLIED MATERIALS, INC. filed a patent application (US2025/048412) for “HYDROGEN ADDITION TO LOW-K DIELECTRIC BARRIER FILMS”. With publication no. WO/2026/128053, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C23C 16/50
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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