GENEVA, May 11 -- HORIBA, LTD. (2, Miyanohigashi-cho, Kisshoin, Minami-ku, Kyoto-shi, Kyoto6018510), 株式会社堀場製作所 (京都府京都市南区吉祥院宮の東町２番地) filed a patent application (PCT/JP2025/038377) for "GAS ANALYSIS SYSTEM, GAS ANALYSIS METHOD, PROGRAM FOR GAS ANALYSIS, AND MATERIAL GAS SUPPLY SYSTEM" on Oct 31, 2025. With publication no. WO/2026/095045, the details related to the patent application was published on May 07, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellect...