GENEVA, March 24 -- HORIBA, LTD. (2, Miyanohigashi-cho, Kisshoin, Minami-ku, Kyoto-shi, Kyoto6018510), 株式会社堀場製作所 (京都府京都市南区吉祥院宮の東町２番地) filed a patent application (PCT/JP2025/022333) for "GAS ANALYSIS DEVICE AND GAS ANALYSIS METHOD" on Jun 20, 2025. With publication no. WO/2026/058535, the details related to the patent application was published on Mar 19, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): ONISH...