International Patent: HETEROPOLYACID SALT WITH MODIFIED DEFECT SITE OR MIXTURE THEREOF, RESIST MATERIAL, AND PATTERN FORMATION METHOD

GENEVA, June 24 -- TOKYO OHKA KOGYO CO., LTD. filed a patent application (JP2025/040866) for “HETEROPOLYACID SALT WITH MODIFIED DEFECT SITE OR MIXTURE THEREOF, RESIST MATERIAL, AND PATTERN FORMATION METHOD”. With publication no. WO/2026/116275, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C07C 381/12

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Disclaimer: Curated by HT Syndication....