International Patent: HARDMASK MODIFICATION TO ENABLE CHANNELING IMPLANTATION ON SILICON CARBIDE DEVICES

GENEVA, July 2 -- APPLIED MATERIALS, INC. filed a patent application (CN2024/141207) for “HARDMASK MODIFICATION TO ENABLE CHANNELING IMPLANTATION ON SILICON CARBIDE DEVICES”. With publication no. WO/2026/129349, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H01L 21/266

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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