INTERNATIONAL PATENT: HANWHA SOLUTIONS CORPORATION, 한화솔루션 주식회사 FILES APPLICATION FOR "XYLYLENE DIISOCYANATE COMPOSITION AND NON-FOAM RESIN COMPRISING SAME"

GENEVA, March 10 -- HANWHA SOLUTIONS CORPORATION (86, Cheonggyecheon-ro,Jung-gu,Seoul 04541), 한화솔루션 주식회사 (서울특별시중구청계천로 86) filed a patent application (PCT/KR2025/011445) for "XYLYLENE DIISOCYANATE COMPOSITION AND NON-FOAM RESIN COMPRISING SAME" on Jul 31, 2025. With publication no. WO/2026/049329, the details related to the patent application was published on Mar 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): JEON, Ju Eun (86, Cheonggyecheon-ro,Jung-...