INTERNATIONAL PATENT: HANWHA SEMITECH CO., LTD., 한화세미텍 주식회사, SAMSUNG ELECTRONICS CO., LTD., 삼성전자 주식회사 FILES APPLICATION FOR "APPARATUS AND METHOD FOR CORRECTING ADSORPTION HEIGHT OF COMPONENT"

Posted On: 2026-03-10

GENEVA, March 10 -- HANWHA SEMITECH CO., LTD. (84, Jeongdong-roSeongsan-gu, Changwon-si,Gyeongsangnam-do 51552), 한화세미텍 주식회사 (경상남도창원시 성산구정동로 84), SAMSUNG ELECTRONICS CO., LTD. (129, Samsung-roYeongtong-gu, Suwon-si,Gyeonggi-do 16677), 삼성전자 주식회사 (경기도수원시 영통구삼성로 129) filed a patent application (PCT/KR2025/012803) for "APPARATUS AND METHOD FOR CORRECTING ADSORPTION HEIGHT OF COMPONENT" on Aug 22, 2025. With publication no. WO/2026/049430, the details relate...

Click here to read full article from source

इस लेख के रीप्रिंट को खरीदने या इस प्रकाशन का पूरा फ़ीड प्राप्त करने के लिए, कृपया हमे संपर्क करें.

विशेष

Category

Source

Publication

Location

INTERNATIONAL PATENT: HANWHA SEMITECH CO., LTD., 한화세미텍 주식회사, SAMSUNG ELECTRONICS CO., LTD., 삼성전자 주식회사 FILES APPLICATION FOR "APPARATUS AND METHOD FOR CORRECTING ADSORPTION HEIGHT OF COMPONENT"