GENEVA, Feb. 16 -- FORMWORK IO LIMITED (Unit C, 17/F, Eton Building, 288 Des Voeux Road, CentralHong Kong) filed a patent application (PCT/CN2025/113131) for "BUILDING MATERIALS FOR ATMOSPHERIC CARBON-DIOXIDE SEQUESTRATION AND CAPTURE AND PRODUCTION METHODS THEREOF" on Aug 07, 2025. With publication no. WO/2026/032349, the details related to the patent application was published on Feb 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): NG, Ka Wai Antonio (Unit C, 17/F, Eton Building, 288 Des Voeux Road, CentralHong Kong), HO, Kwok Wa (Unit C, 17/F, Eton Building, 288 Des Voeux Road, CentralH...