International Patent: FILM-FORMING RESIN OF KRF PHOTORESIST, PREPARATION METHOD THEREFOR, AND USE THEREOF

GENEVA, July 2 -- BEIJING LUMIRAFT TECHNOLOGY CO., LTD. filed a patent application (CN2025/142446) for “FILM-FORMING RESIN OF KRF PHOTORESIST, PREPARATION METHOD THEREFOR, AND USE THEREOF”. With publication no. WO/2026/130286, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C08F 112/14

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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