GENEVA, June 24 -- TOKYO ELECTRON LIMITED filed a patent application (JP2025/034464) for “FILM FORMATION METHOD, FILM FORMATION DEVICE, AND SEMICONDUCTOR DEVICE”. With publication no. WO/2026/115904, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C23C 14/06
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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