International Patent: EXPOSURE MASK DESIGNING METHOD AND SEMICONDUCTOR APPARATUS MANUFACTURING METHOD

GENEVA, July 2 -- RAPIDUS CORPORATION filed a patent application (JP2025/024914) for “EXPOSURE MASK DESIGNING METHOD AND SEMICONDUCTOR APPARATUS MANUFACTURING METHOD”. With publication no. WO/2026/133607, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H10D 89/10

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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