International Patent: EUV DRIVER LASER FOR GENERATING A PLASMA STATE THAT EMITS AN EUV LIGHT BEAM, SYSTEM FOR EXPOSING A PHOTOSENSITIVE COATING, USE OF THE EUV DRIVER LASER, METHOD FOR GENERATING A PLASMA STATE THAT EMITS AN EUV LIGHT BEAM, AND METHOD FOR EXPOSING A PHOTOSENSITIVE COATING

GENEVA, July 27 -- TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING SE filed a patent application (EP2026/050466) for “EUV DRIVER LASER FOR GENERATING A PLASMA STATE THAT EMITS AN EUV LIGHT BEAM, SYSTEM FOR EXPOSING A PHOTOSENSITIVE COATING, USE OF THE EUV DRIVER LASER, METHOD FOR GENERATING A PLASMA STATE THAT EMITS AN EUV LIGHT BEAM, AND METHOD FOR EXPOSING A PHOTOSENSITIVE COATING”. With publication no. WO/2026/153856, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H01S 5/40

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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