INTERNATIONAL PATENT: ESSILOR INTERNATIONAL FILES APPLICATION FOR "SYSTEMS AND COMPUTER IMPLEMENTED METHOD FOR DETERMINING UPDATED VALUES OF MANUFACTURING PARAMETERS TO REDUCE DEFECTS IN MANUFACTURED ITEMS"

GENEVA, April 13 -- ESSILOR INTERNATIONAL (147 rue de Paris94220 CHARENTON-LE-PONT) filed a patent application (PCT/EP2025/077794) for "SYSTEMS AND COMPUTER IMPLEMENTED METHOD FOR DETERMINING UPDATED VALUES OF MANUFACTURING PARAMETERS TO REDUCE DEFECTS IN MANUFACTURED ITEMS" on Sep 29, 2025. With publication no. WO/2026/073853, the details related to the patent application was published on Apr 09, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SILEO, Cedric (C/O Essilor International147 rue de Paris94220 CHARENTON-LE-PONT), BOLTEAU, Guillaume (C/O Essilor International147 rue de Paris94220 ...