INTERNATIONAL PATENT: EDGENE, INC., 주식회사 엣진 FILES APPLICATION FOR "BASE EDITING SYSTEM FOR CORRECTING MITOCHONDRIAL DNA MUTATION ASSOCIATED WITH LEBER HEREDITARY OPTIC NEUROPATHY (LHON)"

GENEVA, April 14 -- EDGENE, INC. (909-1-7ho, D-dong, 30 Songdomirae-ro,Yeonsu-gu,Incheon 21990), 주식회사 엣진 (인천광역시연수구송도미래로 30, 디동 909-1-7호) filed a patent application (PCT/KR2025/015641) for "BASE EDITING SYSTEM FOR CORRECTING MITOCHONDRIAL DNA MUTATION ASSOCIATED WITH LEBER HEREDITARY OPTIC NEUROPATHY (LHON)" on Oct 01, 2025. With publication no. WO/2026/075487, the details related to the patent application was published on Apr 09, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Proper...