GENEVA, May 3 -- ECOLE DE TECHNOLOGIE SUPERIEURE (1100, rue Notre-Dame OuestMontreal, Quebec H3C 1K3) filed a patent application (PCT/CA2025/051388) for "WEARABLE GARMENT FOR SPINAL POSITION MONITORING" on Oct 21, 2025. With publication no. WO/2026/085612, the details related to the patent application was published on Apr 30, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): PATHAMMAVONG, Aruny (9136, 12e avenue,Montreal, Quebec H1Z 3J6)
Abstract: A wearable garment comprises a garment body made of a deformable material and configured to cover at least a torso of a wearer, at least one interf...