GENEVA, June 26 -- INTERNATIONAL INNOVATION CENTER OF TSINGHUA UNIVERSITY, SHANGHAI filed a patent application (CN2025/073636) for “DESIGN METHOD AND APPARATUS FOR PHOTOMASK, STORAGE MEDIUM, AND ELECTRONIC DEVICE”. With publication no. WO/2026/118163, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G03F 1/70
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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