GENEVA, Sept. 24 -- AIXTRON SE filed a patent application (EP2026/057576) for “DEPOSITION OF VERTICAL AND LATERAL 2D-2D HETEROSTRUCTURES USING CVD”. With publication no. WO/2026/195707, here are the other details related to the patent application:
Kind: Initial Publication without ISR [A2]
IPC: H10P 14/24
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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