GENEVA, July 1 -- HITACHI HIGH-TECH CORPORATION filed a patent application (JP2024/044231) for “DEFECT INSPECTION SYSTEM, DEFECT INSPECTION METHOD, AND COMPUTER”. With publication no. WO/2026/126483, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G01N 23/2251
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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