GENEVA, July 27 -- SAN-APRO LTD. filed a patent application (JP2026/000677) for “COMPOUND, NONIONIC PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY”. With publication no. WO/2026/155099, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C07D 221/14
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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