International Patent: COMPOSITIONS AND METHODS FOR VAPOR PHASE SURFACE MODIFICATION

GENEVA, June 19 -- FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. filed a patent application (US2025/055469) for “COMPOSITIONS AND METHODS FOR VAPOR PHASE SURFACE MODIFICATION”. With publication no. WO/2026/107286, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C11D 3/43

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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