International Patent: COLLOIDAL SILICA AND CHEMICAL MECHANICAL POLISHING COMPOSITION COMPRISING SAME

GENEVA, July 9 -- ENF TECHNOLOGY CO., LTD. filed a patent application (KR2025/022896) for “COLLOIDAL SILICA AND CHEMICAL MECHANICAL POLISHING COMPOSITION COMPRISING SAME”. With publication no. WO/2026/147102, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C01B 33/14

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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